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Results:
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Results: 2
HIGH-RESOLUTION PHOTORESISTS FOR SEMICONDUCTOR PRODUCTION
Authors:
MERREM HJ DAMMEL R PAWLOWSKI G
Citation:
Hj. Merrem et al., HIGH-RESOLUTION PHOTORESISTS FOR SEMICONDUCTOR PRODUCTION, Journal of information recording, 22(5-6), 1996, pp. 481-520
A PERCOLATION VIEW OF NOVOLAK DISSOLUTION .3. DISSOLUTION INHIBITION
Authors:
SHIH HY YEH TF REISER A DAMMEL RR MERREM HJ PAWLOWSKI G
Citation:
Hy. Shih et al., A PERCOLATION VIEW OF NOVOLAK DISSOLUTION .3. DISSOLUTION INHIBITION, Macromolecules, 27(12), 1994, pp. 3330-3336
Risultati:
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