Authors: NAKANISHI T MITSUHIRA N HISADA M NAGAMI A HASHIMOTO M HANAFUSA K OKUMURA N

Citation: T. Nakanishi et al., INFLUENCE OF O-2-RIE ON SILICON SUBSTRATE - ESTIMATING PLASMA DAMAGE WITH BIPOLAR-TRANSISTOR CHARACTERISTICS, Microelectronic engineering, 42, 1998, pp. 399-402