Authors: FEDYNYSHYN TH THACKERAY JW MORI JM

Citation: Th. Fedynyshyn et al., THE EFFECT OF DIFFUSION, REACTION ORDER, AND DEVELOPER SELECTIVITY ONTHE PERFORMANCE OF POSITIVE DUV RESISTS, Microelectronic engineering, 23(1-4), 1994, pp. 315-320

Authors: THACKERAY JW DENISON M FEDYNYSHYN TH GEORGER J MORI JM ORSULA GW

Citation: Jw. Thackeray et al., DISSOLUTION RATE PROPERTIES OF 3-COMPONENT DEEP-ULTRAVIOLET POSITIVE PHOTORESISTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2855-2861