Authors: UCHIYAMA S OHKI S OZAWA A ODA M MATSUDA T MOROSAWA T

Citation: S. Uchiyama et al., IMPROVING X-RAY MASK PATTERN PLACEMENT ACCURACY BY CORRECTING PROCESSDISTORTION IN ELECTRON-BEAM WRITING, JPN J A P 1, 34(12B), 1995, pp. 6743-6747