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Properties of posttreated low kappa flowfill (TM) films and their stability after etch, resist and polymer strip processes
Authors:
Beekmann, K Wilby, A Giles, K Macneil, J
Citation:
K. Beekmann et al., Properties of posttreated low kappa flowfill (TM) films and their stability after etch, resist and polymer strip processes, MICROEL ENG, 55(1-4), 2001, pp. 73-79
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