Authors: Medeiros, DR Aviram, A Guarnieri, CR Huang, WS Kwong, R Magg, CK Mahorowala, AP Moreau, WM Petrillo, KE Angelopoulos, M

Citation: Dr. Medeiros et al., Recent progress in electron-beam a resists for advanced mask-making, IBM J RES, 45(5), 2001, pp. 639-650