Authors: Mahorowala, AP Medeiros, DR

Citation: Ap. Mahorowala et Dr. Medeiros, Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists, J VAC SCI A, 19(4), 2001, pp. 1374-1378

Authors: Medeiros, DR Aviram, A Guarnieri, CR Huang, WS Kwong, R Magg, CK Mahorowala, AP Moreau, WM Petrillo, KE Angelopoulos, M

Citation: Dr. Medeiros et al., Recent progress in electron-beam a resists for advanced mask-making, IBM J RES, 45(5), 2001, pp. 639-650

Authors: Mahorowala, AP Babich, K Lin, Q Medeiros, DR Petrillo, K Simons, J Angelopoulos, M Sooriyakumaran, R Hofer, D Reynolds, GW Taylor, JW

Citation: Ap. Mahorowala et al., Transfer etching of bilayer resists in oxygen-based plasmas, J VAC SCI A, 18(4), 2000, pp. 1411-1419