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Results: 1-7 |
Results: 7

Authors: Manako, S Ochiai, Y Yamamoto, H Teshima, T Fujita, J Nomura, E
Citation: S. Manako et al., High-purity, ultrahigh-resolution calixarene electron-beam negative resist, J VAC SCI B, 18(6), 2000, pp. 3424-3427

Authors: Sakamoto, T Manako, S Fujita, J Ochiai, Y Baba, T Yamamoto, H Teshima, T
Citation: T. Sakamoto et al., Nanometer-scale resolution of a chloromethylated calixarene negative resist in electron-beam lithography: Dependence on the number of phenolic residues, APPL PHYS L, 77(2), 2000, pp. 301-303

Authors: Yamashita, H Nomura, E Manako, S Kobinata, H Nakajima, K Nozue, H
Citation: H. Yamashita et al., Proximity effect correction by the GHOST method using a scattering stencilmask, J VAC SCI B, 17(6), 1999, pp. 2860-2863

Authors: Ochiai, Y Manako, S Fujita, J Nomura, E
Citation: Y. Ochiai et al., High resolution organic resists for charged particle lithography, J VAC SCI B, 17(3), 1999, pp. 933-938

Authors: Sone, J Fujita, J Ochiai, Y Manako, S Matsui, S Nomura, E Baba, T Kawaura, H Sakamoto, T Chen, CD Nakamura, Y Tsai, JS
Citation: J. Sone et al., Nanofabrication toward sub-10 nm and its application to novel nanodevices, NANOTECHNOL, 10(2), 1999, pp. 135-141

Authors: Ochiai, Y Manako, S Fujita, J Nomura, E
Citation: Y. Ochiai et al., Nanometer electron beam lithography, NEC RES DEV, 40(4), 1999, pp. 388-392

Authors: Manako, S Fujita, J Tanigaki, K Ochiai, Y Nomura, E
Citation: S. Manako et al., Sub-10-nm electron beam lithography using a poly(alpha-methylstyrene) resist with a molecular weight of 650, JPN J A P 1, 37(12B), 1998, pp. 6785-6787
Risultati: 1-7 |