AAAAAA

   
Results: 1-3 |
Results: 3
Ion-enhanced etching of Si(100) with molecular chlorine: Neutral and ionicproduct yields as a function of ion kinetic energy and molecular chlorine flux
Authors: Materer, N Goodman, RS Leone, SR
Citation: N. Materer et al., Ion-enhanced etching of Si(100) with molecular chlorine: Neutral and ionicproduct yields as a function of ion kinetic energy and molecular chlorine flux, J PHYS CH B, 104(14), 2000, pp. 3261-3266
Temperature dependence of neutral and positively charged Si and SiCl etch products during argon-ion-enhanced etching of Si(100) by Cl-2
Authors: Materer, N Goodman, RS Leone, SR
Citation: N. Materer et al., Temperature dependence of neutral and positively charged Si and SiCl etch products during argon-ion-enhanced etching of Si(100) by Cl-2, J VAC SCI B, 18(1), 2000, pp. 191-196
Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields
Authors: Goodman, RS Materer, N Leone, SR
Citation: Rs. Goodman et al., Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields, J VAC SCI A, 17(6), 1999, pp. 3340-3350
Risultati: 1-3 |