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Results:
1-18
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Results: 18
Authors:
Laursen, T
Chandrasekhar, D
Hervig, RL
Mayer, JW
Smith, DJ
Jasper, C
Citation: T. Laursen et al., Fabrication and characterization of C implantation standards for Si1-x-yGexCy alloys, J VAC SCI A, 19(6), 2001, pp. 2879-2883
Authors:
Hochbauer, T
Misra, A
Verda, R
Zheng, Y
Lau, SS
Mayer, JW
Nastasi, M
Citation: T. Hochbauer et al., The influence of ion-implantation damage on hydrogen-induced ion-cut, NUCL INST B, 175, 2001, pp. 169-175
Authors:
Alford, TL
Nguyen, P
Zeng, YX
Mayer, JW
Citation: Tl. Alford et al., Advanced silver-based metallization patterning for ULSI applications, MICROEL ENG, 55(1-4), 2001, pp. 383-388
Authors:
Alford, TL
Zeng, YX
Nguyen, P
Chen, LH
Mayer, JW
Citation: Tl. Alford et al., Self-encapsulation effects on the electromigration resistance of silver lines, MICROEL ENG, 55(1-4), 2001, pp. 389-395
Authors:
Malgas, GF
Adams, D
Nguyen, P
Wang, Y
Alford, TL
Mayer, JW
Citation: Gf. Malgas et al., Investigation of the effects of different annealing ambients on Ag/Al bilayers: Electrical properties and morphology, J APPL PHYS, 90(11), 2001, pp. 5591-5598
Authors:
Zheng, Y
Lau, SS
Hochbauer, T
Misra, A
Verda, R
He, XM
Nastasi, M
Mayer, JW
Citation: Y. Zheng et al., Orientation dependence of blistering in H-implanted Si, J APPL PHYS, 89(5), 2001, pp. 2972-2978
Authors:
Hochbauer, T
Misra, A
Nastasi, M
Mayer, JW
Citation: T. Hochbauer et al., Investigation of the cut location in hydrogen implantation induced siliconsurface layer exfoliation, J APPL PHYS, 89(11), 2001, pp. 5980-5990
Authors:
Gadre, KS
Alford, TL
Mayer, JW
Citation: Ks. Gadre et al., Use of TiN(O)/Ti as an effective intermediate stress buffer and diffusion barrier for Cu/parylene-n interconnects, APPL PHYS L, 79(20), 2001, pp. 3260-3262
Authors:
Mitan, MM
Pivin, DP
Alford, TL
Mayer, JW
Citation: Mm. Mitan et al., Direct patterning of nanometer-scale silicide structures on silicon by ion-beam implantation through a thin barrier layer, APPL PHYS L, 78(18), 2001, pp. 2727-2729
Authors:
Hochbauer, T
Misra, A
Verda, R
Nastasi, M
Mayer, JW
Zheng, Y
Lau, SS
Citation: T. Hochbauer et al., Hydrogen-implantation induced silicon surface layer exfoliation, PHIL MAG B, 80(11), 2000, pp. 1921-1931
Authors:
Taft, WS
Mayer, JW
Citation: Ws. Taft et Jw. Mayer, The structure and analysis of paintings, SCIENCE OF PAINTINGS, 2000, pp. 1-11
Authors:
Pretorius, R
Theron, CC
Vantomme, A
Mayer, JW
Citation: R. Pretorius et al., Compound phase formation in thin film structures, CR R SOLID, 24(1), 1999, pp. 1-62
Authors:
Petrusa, ER
Issenberg, SB
Mayer, JW
Felner, JM
Brown, DD
Waugh, RA
Kondos, GT
Gessner, IH
McGaghie, WC
Citation: Er. Petrusa et al., Implementation of a four-year multimedia computer curriculum in cardiologyat six medical schools, ACAD MED, 74(2), 1999, pp. 123-129
Authors:
Gordon, MS
Issenberg, SB
Mayer, JW
Felner, JM
Citation: Ms. Gordon et al., Developments in the use of simulators and multimedia computer systems in medical education, MED TEACH, 21(1), 1999, pp. 32-36
Authors:
Issenberg, SB
McGaghie, WC
Hart, IR
Mayer, JW
Felner, JM
Petrusa, ER
Waugh, RA
Brown, DD
Safford, RR
Gessner, IH
Gordon, DL
Ewy, GA
Citation: Sb. Issenberg et al., Simulation technology for health care professional skills training and assessment, J AM MED A, 282(9), 1999, pp. 861-866
Authors:
Wang, Y
Alford, TL
Mayer, JW
Citation: Y. Wang et al., Kinetics of Ag/Al bilayer self-encapsulation, J APPL PHYS, 86(10), 1999, pp. 5407-5412
Authors:
Hochbauer, T
Nastasi, M
Mayer, JW
Citation: T. Hochbauer et al., Hydrogen blister depth in boron and hydrogen coimplanted n-type silicon, APPL PHYS L, 75(25), 1999, pp. 3938-3940
Authors:
Stein, BL
Yu, ET
Croke, ET
Hunter, AT
Laursen, T
Mayer, JW
Ahn, CC
Citation: Bl. Stein et al., Deep-level transient spectroscopy of Si/Si1-x-y GexCy heterostructures, APPL PHYS L, 73(5), 1999, pp. 647-649
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