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Results: 1-8 |
Results: 8
Electron beam lithography simulation on homogeneous and multilayer substrates
Authors: Raptis, I Nowotny, B Glezos, N Gentili, M Meneghini, G
Citation: I. Raptis et al., Electron beam lithography simulation on homogeneous and multilayer substrates, JPN J A P 1, 39(2A), 2000, pp. 635-644
1.55-mu m optical short pulse generation at 10-GHz repetition rate, using a mode-locked hybrid distributed Bragg reflector (ML-HDBR) laser source
Authors: Paoletti, R Bertone, D Fang, R Magnetti, G Meliga, M Meneghini, G Morello, G Rossi, G Tallone, L Scofet, M
Citation: R. Paoletti et al., 1.55-mu m optical short pulse generation at 10-GHz repetition rate, using a mode-locked hybrid distributed Bragg reflector (ML-HDBR) laser source, IEEE PHOTON, 12(3), 2000, pp. 245-247
Oral 5-fluorouracil in squamous cell carcinoma of the skin in the aged
Authors: Cartei, G Cartei, F Interlandi, G Meneghini, G Jop, A Zingone, G Tabaro, G Mazzoleni, F
Citation: G. Cartei et al., Oral 5-fluorouracil in squamous cell carcinoma of the skin in the aged, AM J CL ONC, 23(2), 2000, pp. 181-184
Preface to the Micro and Nano Engineering 1999 proceedings publication
Authors: Gentili, M Di Fabrizio, E Meneghini, G
Citation: M. Gentili et al., Preface to the Micro and Nano Engineering 1999 proceedings publication, MICROEL ENG, 53(1-4), 2000, pp. 1-1
Aqueous base developable epoxy resist for high sensitivity electron beam lithography
Authors: Argitis, P Glezos, N Vasilopoulou, M Raptis, I Hatzakis, M Everett, J Meneghini, G Palumbo, A Ardito, M Hudek, P Kostic, I
Citation: P. Argitis et al., Aqueous base developable epoxy resist for high sensitivity electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 453-456
Fabrication of phase masks, for fiber grating printing, using EBL and CHF3RIE
Authors: Ardito, M Boschis, L Palumbo, R Meneghini, G
Citation: M. Ardito et al., Fabrication of phase masks, for fiber grating printing, using EBL and CHF3RIE, MICROEL ENG, 46(1-4), 1999, pp. 251-254
Simulation of chemically amplified resist processes for 150 nm e-beam lithography
Authors: Rosenbusch, A Cui, Z DiFabrizio, E Gentili, M Glezos, N Meneghini, G Nowotny, B Patsis, G Prewett, P Raptis, I
Citation: A. Rosenbusch et al., Simulation of chemically amplified resist processes for 150 nm e-beam lithography, MICROEL ENG, 46(1-4), 1999, pp. 379-382
Silylation and dry development of chemically amplified resists SAL601(1),AZPN114*(1), and epoxidised resist (EPR*(1)) for high resolution electron-beam lithography
Authors: Tegou, E Gogolides, E Argitis, P Raptis, I Meneghini, G Cui, Z
Citation: E. Tegou et al., Silylation and dry development of chemically amplified resists SAL601(1),AZPN114*(1), and epoxidised resist (EPR*(1)) for high resolution electron-beam lithography, JPN J A P 1, 37(12B), 1998, pp. 6873-6876
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