Authors: Kunimune, Y Nishio, N Kodama, N Kikuchi, H Toda, T Mineji, A Shishiguchi, S Saito, S

Citation: Y. Kunimune et al., Lateral diffusion distance measurement of 40-80 nm junctions by etching/TEM-electron energy loss spectroscopy method, JPN J A P 1, 38(4B), 1999, pp. 2314-2318