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Results: 1-10 |
Results: 10
Formation and deformation of multiwall carbon nanotubes in arc discharge
Authors: Takikawa, H Tao, Y Miyano, R Sakakibara, T Zhao, XL Ando, Y
Citation: H. Takikawa et al., Formation and deformation of multiwall carbon nanotubes in arc discharge, JPN J A P 1, 40(5A), 2001, pp. 3414-3418
Carbon nanotubes on electrodes in short-time heteroelectrode arc
Authors: Takikawa, H Tao, Y Miyano, R Sakakibara, T Ando, Y Zhao, XL Hirahara, K Iijima, S
Citation: H. Takikawa et al., Carbon nanotubes on electrodes in short-time heteroelectrode arc, MAT SCI E C, 16(1-2), 2001, pp. 11-16
Corrosion resistance of TiN coatings produced by various dry processes
Authors: Morita, R Azuma, K Inoue, S Miyano, R Takikawa, H Kobayashi, A Fujiwara, E Uchida, H Yatsuzuka, M
Citation: R. Morita et al., Corrosion resistance of TiN coatings produced by various dry processes, SURF COAT, 136(1-3), 2001, pp. 207-210
Cathode spot motion in vacuum arc of zinc cathode under oxygen gas flow
Authors: Miyano, R Fujimura, Y Takikawa, H Sakakibara, T Nagao, M
Citation: R. Miyano et al., Cathode spot motion in vacuum arc of zinc cathode under oxygen gas flow, IEEE PLAS S, 29(5), 2001, pp. 713-717
Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases
Authors: Miyano, R Saito, T Kimura, K IKeda, M Takikawa, H Sakakibara, T
Citation: R. Miyano et al., Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases, THIN SOL FI, 390(1-2), 2001, pp. 192-196
Effect of substrate bias on AlN thin film preparation in shielded reactivevacuum are deposition
Authors: Takikawa, H Kimura, K Miyano, R Sakakibara, T Bendavid, A Martin, PJ Matsumuro, A Tsutsumi, K
Citation: H. Takikawa et al., Effect of substrate bias on AlN thin film preparation in shielded reactivevacuum are deposition, THIN SOL FI, 386(2), 2001, pp. 276-280
Amorphous carbon fibrilliform nanomaterials prepared by chemical vapor deposition
Authors: Takikawa, H Yatsuki, M Miyano, R Nagayama, M Sakakibara, T Itoh, S Ando, Y
Citation: H. Takikawa et al., Amorphous carbon fibrilliform nanomaterials prepared by chemical vapor deposition, JPN J A P 1, 39(9A), 2000, pp. 5177-5179
Preparation of metal nitride and oxide thin films using shielded reactive vacuum arc deposition
Authors: Miyano, R Kimura, K Izumi, K Takikawa, H Sakakibara, T
Citation: R. Miyano et al., Preparation of metal nitride and oxide thin films using shielded reactive vacuum arc deposition, VACUUM, 59(1), 2000, pp. 159-167
ZnO film formation using a steered and shielded reactive vacuum arc deposition
Authors: Takikawa, H Kimura, K Miyano, R Sakakibara, T
Citation: H. Takikawa et al., ZnO film formation using a steered and shielded reactive vacuum arc deposition, THIN SOL FI, 377, 2000, pp. 74-80
Control of Cl-2 plasma by electron-beam-excited plasma and poly-Si etching
Authors: Mikawa, Y Miyano, R Inaguma, J Shiraki, Y Mutsuga, F Fujii, M Ikezawa, S
Citation: Y. Mikawa et al., Control of Cl-2 plasma by electron-beam-excited plasma and poly-Si etching, VACUUM, 51(4), 1998, pp. 531-535
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