Authors:
Marsh, CD
Moiseiwitsch, NE
Booker, GR
Ashburn, P
Citation: Cd. Marsh et al., Behavior and effects of fluorine in annealed n(+) polycrystalline silicon layers on silicon wafers, J APPL PHYS, 87(10), 2000, pp. 7567-7578
Authors:
Moiseiwitsch, NE
Ashburn, P
Marsh, CD
Booker, GR
Citation: Ne. Moiseiwitsch et al., Assessment of a methanol-last interface treatment for use in polysilicon emitter bipolar transistor fabrication, EL SOLID ST, 1(2), 1998, pp. 91-93