Authors: NISHINO H HAYASAKA N HORIOKA K SHIOZAWA J NADAHARA S SHOODA N AKAMA Y SAKAI A OKANO H

Citation: H. Nishino et al., SMOOTHING OF THE SI SURFACE USING CF4 O2 DOWN-FLOW ETCHING/, Journal of applied physics, 74(2), 1993, pp. 1349-1353