Authors:
FRECHET JMJ
LEUNG MK
URANKAR EJ
WILLSON CG
CAMERON JF
MACDONALD SA
NIESERT CP
Citation: Jmj. Frechet et al., PHOTOGENERATED BASE IN RESIST AND IMAGING MATERIALS - DESIGN OF FUNCTIONAL POLYMERS SUSCEPTIBLE TO BASE-CATALYZED DECARBOXYLATION, Chemistry of materials, 9(12), 1997, pp. 2887-2893