Authors: Ogasawara, M Shimomura, N Takamatsu, J Yoshitake, S Ooki, K Nakayamada, N Okabe, H Tojo, T Takigawa, T

Citation: M. Ogasawara et al., Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system, J VAC SCI B, 17(6), 1999, pp. 2936-2939