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Results: 1-8 |
Results: 8

Authors: Fischetti, MV Neumayer, DA Cartier, EA
Citation: Mv. Fischetti et al., Effective electron mobility in Si inversion layers in metal-oxide-semiconductor systems with a high-kappa insulator: The role of remote phonon scattering, J APPL PHYS, 90(9), 2001, pp. 4587-4608

Authors: Neumayer, DA Cartier, E
Citation: Da. Neumayer et E. Cartier, Materials characterization of ZrO2-SiO2 and HfO2-SiO2 binary oxides deposited by chemical solution deposition, J APPL PHYS, 90(4), 2001, pp. 1801-1808

Authors: Saenger, KL Neumayer, DA
Citation: Kl. Saenger et Da. Neumayer, Determination of Ir consumption during thermal oxidation and PbZrxTi1-xO3 processing using Bragg-peak fringe analysis, J APPL PHYS, 89(6), 2001, pp. 3132-3137

Authors: Saenger, KL Cabral, C Duncombe, PR Grill, A Neumayer, DA
Citation: Kl. Saenger et al., Oxygen stoichiometry in PdOx and PdOx/Pt electrode layers during processing of ferroelectric and high-epsilon perovskites, J MATER RES, 15(4), 2000, pp. 961-966

Authors: Studebaker, DB Neumayer, DA Hinds, BJ Stern, CL Marks, TJ
Citation: Db. Studebaker et al., Encapsulating bis(beta-ketoiminato) polyethers. Volatile, fluorine-free barium precursors for metal-organic chemical vapor deposition, INORG CHEM, 39(15), 2000, pp. 3148-3157

Authors: Neumayer, DA Duncombe, PR Laibowitz, RB Shaw, T Berndt, L Black, CT Grill, A
Citation: Da. Neumayer et al., Fabrication of multilayer ferroelectric films, INTEGR FERR, 25(1-4), 1999, pp. 615-626

Authors: Barz, R Neumayer, DA Dey, SK
Citation: R. Barz et al., Properties of zirconium doped Sr-Bi-Ta-O thin films, INTEGR FERR, 25(1-4), 1999, pp. 627-637

Authors: Dimitrakopoulos, CD Kymissis, I Purushothaman, S Neumayer, DA Duncombe, PR Laibowitz, RB
Citation: Cd. Dimitrakopoulos et al., Low-voltage, high-mobility pentacene transistors with solution-processed high dielectric constant insulators, ADVAN MATER, 11(16), 1999, pp. 1372-1375
Risultati: 1-8 |