Authors:
Cheng, DG
Tsukamoto, K
Komiyama, H
Nishimoto, Y
Tokumasu, N
Maeda, K
Citation: Dg. Cheng et al., Thermal desorption spectra of SiO2 films deposited on Si and on thermal SiO2 by tetraethylorthosilicate/O-3 atmospheric-pressure chemical vapor deposition, J APPL PHYS, 85(10), 1999, pp. 7140-7145