Login
|
New Account
AAAAAA
ITA
ENG
Results:
1-2
|
Results: 2
Combined silicon, beryllium, and carbon tetrabromide single-port dopant source for molecular-beam epitaxy
Authors:
Moshegov, NT Nordquist, CD Cai, WZ Mayer, TS Lubyshev, DI Miller, DL
Citation:
Nt. Moshegov et al., Combined silicon, beryllium, and carbon tetrabromide single-port dopant source for molecular-beam epitaxy, J VAC SCI B, 19(4), 2001, pp. 1541-1545
Electric-field assisted assembly and alignment of metallic nanowires
Authors:
Smith, PA Nordquist, CD Jackson, TN Mayer, TS Martin, BR Mbindyo, J Mallouk, TE
Citation:
Pa. Smith et al., Electric-field assisted assembly and alignment of metallic nanowires, APPL PHYS L, 77(9), 2000, pp. 1399-1401
Risultati:
1-2
|