Authors: Oh, JH Yeom, HW Hagimoto, Y Ono, K Oshima, M Hirashita, N Nywa, M Toriumi, A Kakizaki, A

Citation: Jh. Oh et al., Chemical structure of the ultrathin SiO2/Si(100) interface: An angle-resolved Si 2p photoemission study - art. no. 205310, PHYS REV B, 6320(20), 2001, pp. 5310