AAAAAA
Results:
1-10
|
Results: 10
Authors:
SCHWARZ J
SCHMIDT M
OHL A
Citation: J. Schwarz et al., SYNTHESIS OF PLASMA-POLYMERIZED HEXAMETHYLDISILOXANE (HMDSO) FILMS BYMICROWAVE-DISCHARGE, Surface & coatings technology, 98(1-3), 1998, pp. 859-864
Authors:
GUO XM
OHL A
Citation: Xm. Guo et A. Ohl, SPATIALLY-RESOLVED ION ENERGY-DISTRIBUTION MEASUREMENTS IN A LARGE-AREA PLANAR MICROWAVE PLASMA, Journal of physics. D, Applied physics, 31(16), 1998, pp. 2018-2024
MODELING THE KINETICS OF NEUTRAL PARTICLES IN LOW-PRESSURE CHEMICALLYACTIVE PLANAR MICROWAVE PLASMAS
Authors:
STROBEL H
OHL A
Citation: H. Strobel et A. Ohl, MODELING THE KINETICS OF NEUTRAL PARTICLES IN LOW-PRESSURE CHEMICALLYACTIVE PLANAR MICROWAVE PLASMAS, Journal of applied physics, 84(8), 1998, pp. 4137-4152
Authors:
SCHIELKE W
ROTTIG G
BANDLOW I
PICKALOV V
OHL A
Citation: W. Schielke et al., ON THE CAPABILITY OF SPECTRALLY RESOLVED OPTICAL-EMISSION TOMOGRAPHY FOR THE DIAGNOSTIC OF NONISOTHERMAL LOW-PRESSURE TECHNOLOGICAL PLASMAS, Surface & coatings technology, 97(1-3), 1997, pp. 742-748
Authors:
ASTASHKEVICH SA
KANING M
KANING E
KOKINA NV
LAVROV BP
OHL A
ROPCKE J
Citation: Sa. Astashkevich et al., RADIATIVE CHARACTERISTICS OF 3P-SIGMA,PI, 3D-PI(-),DELTA(-) STATES OFH-2 AND DETERMINATION OF GAS TEMPERATURE OF LOW-PRESSURE HYDROGEN-CONTAINING PLASMAS, Journal of quantitative spectroscopy & radiative transfer, 56(5), 1996, pp. 725-751
Authors:
OHL A
STROBEL H
ROPCKE J
KAMMERSTETTER H
PRIES A
SCHNEIDER M
Citation: A. Ohl et al., INVESTIGATION OF PLASMA SURFACE CLEANING IN PLANAR LOW-PRESSURE MICROWAVE DISCHARGES, Surface & coatings technology, 74-5(1-3), 1995, pp. 59-62
Authors:
SCHIELKE W
ROTTIG G
OHL A
HANNEMAN M
SCHLEINITZ W
Citation: W. Schielke et al., SPATIAL VARIATIONS OF PLASMA STRUCTURES UNDER THE INFLUENCE OF ELECTRICALLY BIASED PROBES AND TEST OBJECTS MEASURED BY OPTICAL-EMISSION COMPUTERIZED-TOMOGRAPHY, Surface & coatings technology, 74-5(1-3), 1995, pp. 552-561
Authors:
ROPCKE J
OHL A
Citation: J. Ropcke et A. Ohl, TEMPERATURE DISTRIBUTIONS ACROSS THE PLASMA-LAYER OF PLANAR LOW-PRESSURE MICROWAVE PLASMAS - A COMPARATIVE INVESTIGATION BY OPTICAL-EMISSION SPECTROSCOPY, Contributions to Plasma Physics, 34(4), 1994, pp. 575-586
Authors:
OHL A
Citation: A. Ohl, PLASMAPHYSICAL AND PLASMACHEMICAL ASPECTS OF DIAMOND DEPOSITION IN LOW-PRESSURE PLASMAS, Pure and applied chemistry, 66(6), 1994, pp. 1397-1404
Authors:
ROPCKE J
OHL A
SCHMIDT M
Citation: J. Ropcke et al., COMPARISON OF OPTICAL-EMISSION SPECTROMETRIC MEASUREMENTS OF THE CONCENTRATION AND ENERGY OF SPECIES IN LOW-PRESSURE MICROWAVE AND RADIOFREQUENCY PLASMA SOURCES, Journal of analytical atomic spectrometry, 8(6), 1993, pp. 803-808
Risultati:
1-10
|