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Results: 4

Authors: ONO K SUZUKI T SAKUTA H ONISAWA K HIROSHIMA M SASAKI T TSUMURA M KONISHI N
Citation: K. Ono et al., A 24 CM DIAGONAL TFT-LCD FABRICATED USING A SIMPLIFIED, 4-PHOTOLITHOGRAPHIC MASK PROCESS, IEICE transactions on electronics, E79C(8), 1996, pp. 1097-1102

Authors: LEBLANC F MAEDA Y ONISAWA K MINEMURA T
Citation: F. Leblanc et al., BULK AND SURFACE DENSITIES OF STATES OF 0.3-MU-M-THICK HYDROGENATED AMORPHOUS-SILICON FILMS USING PHOTOTHERMAL DEFLECTION SPECTROSCOPY, Physical review. B, Condensed matter, 50(19), 1994, pp. 14613-14616

Authors: KANEKO T WAKAGI M ONISAWA K MINEMURA T
Citation: T. Kaneko et al., CHANGE IN CRYSTALLINE MORPHOLOGIES OF POLYCRYSTALLINE SILICON FILMS PREPARED BY RADIOFREQUENCY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING SIF4-MIXTURE AT 350-DELTA-C(H2 GAS), Applied physics letters, 64(14), 1994, pp. 1865-1867

Authors: KANEKO T ONISAWA K WAKAGI M KITA Y MINEMURA T
Citation: T. Kaneko et al., CRYSTALLINE FRACTION OF MICROCRYSTALLINE SILICON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING PULSED SILANE FLOW, JPN J A P 1, 32(11A), 1993, pp. 4907-4911
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