Authors: Hirscher, S Kaesmaier, R Domke, WD Wolter, A Loschner, H Cekan, E Horner, C Zeininger, M Ochsenhirt, J

Citation: S. Hirscher et al., Resist process development for sub-100-nm ion projection lithography, MICROEL ENG, 57-8, 2001, pp. 517-530