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Aoki, M
Oguma, H
Fukushima, S
Ishii, S
Ohtani, S
Murakami, G
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Authors:
Oguma, H
Murakami, G
Takahashi-Iwanaga, H
Aoki, M
Ishii, S
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Yoshitomi, T
Oguma, H
Ohguro, T
Morifuji, E
Morimoto, T
Momose, HS
Kimijima, H
Katsumata, Y
Iwai, H
Citation: T. Yoshitomi et al., A high performance 0.15 mu m buried channel pMOSFET with extremely shallowcounter doped channel region using solid phase diffusion, SOL ST ELEC, 43(7), 1999, pp. 1209-1214