Authors:
Kotera, M
Yamaguchi, K
Sakai, M
Naruse, K
Okagawa, T
Matsuoka, K
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., Influence of electron acceleration voltage in the cell-projection lithography system, MICROEL ENG, 53(1-4), 2000, pp. 353-356
Authors:
Kotera, M
Yamaguchi, K
Okagawa, T
Matsuoka, K
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., Characteristic variation of exposure pattern in cell-projection electron-beam lithography, JPN J A P 1, 38(12B), 1999, pp. 7031-7034
Authors:
Okagawa, T
Matsuoka, K
Kojima, Y
Yoshida, A
Matsui, S
Santo, I
Anazawa, N
Kaito, T
Citation: T. Okagawa et al., Inspection of stencil mask using transmission electrons for character projection electron beam lithography, MICROEL ENG, 46(1-4), 1999, pp. 279-282