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Citation: M. Tuda et al., A new cleaning technique for X-ray masks in alkaline solutions by direct control of electrochemical potential, JPN J A P 1, 39(12B), 2000, pp. 6923-6930

Authors: Tuda, M Ono, K Ootera, H Tsuchihashi, M Hanazaki, M Komemura, T

Citation: M. Tuda et al., Large-diameter microwave plasma source excited by azimuthally symmetric surface waves, J VAC SCI A, 18(3), 2000, pp. 840-848

Authors: Nishikawa, K Ootera, H Tomohisa, S Oomori, T

Citation: K. Nishikawa et al., Transport mechanisms of ions and neutrals in low-pressure, high-density plasma etching of high aspect ratio contact holes, THIN SOL FI, 374(2), 2000, pp. 190-207