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Results: 1-8 |
Results: 8
GROWTH AND CHARACTERIZATION OF CARBON NITRIDE THIN-FILMS PREPARED BY LASER-ABLATION
Authors: SOTO R GONZALEZ P REDONDAS X PARADA EG POU J LEON B PEREZAMOR M DASILVA MF SOARES JC
Citation: R. Soto et al., GROWTH AND CHARACTERIZATION OF CARBON NITRIDE THIN-FILMS PREPARED BY LASER-ABLATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 138, 1998, pp. 236-240
CARBON NITRIDE FILMS PREPARED BY EXCIMER-LASER ABLATION
Authors: GONZALEZ P SOTO R PARADA EG REDONDAS X CHIUSSI S SERRA J POU J LEON B PEREZAMOR M
Citation: P. Gonzalez et al., CARBON NITRIDE FILMS PREPARED BY EXCIMER-LASER ABLATION, Applied surface science, 110, 1997, pp. 380-383
SILICA DEPOSITION BY EXCIMER-LASER-INDUCED CHEMICAL-VAPOR-DEPOSITION IN PERPENDICULAR CONFIGURATION
Authors: LEON B KLUMPP A GONZALEZ P PARADA EG FERNANDEZ D POU J SERRA J SIGMUND H PEREZAMOR M
Citation: B. Leon et al., SILICA DEPOSITION BY EXCIMER-LASER-INDUCED CHEMICAL-VAPOR-DEPOSITION IN PERPENDICULAR CONFIGURATION, Advanced materials for optics and electronics, 6(2), 1996, pp. 83-92
AGING OF PHOTOCHEMICAL VAPOR-DEPOSITED SILICON-OXIDE THIN-FILMS
Authors: PARADA EG GONZALEZ P POU J SERRA J FERNANDEZ D LEON B PEREZAMOR M
Citation: Eg. Parada et al., AGING OF PHOTOCHEMICAL VAPOR-DEPOSITED SILICON-OXIDE THIN-FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 436-440
MODIFICATION OF SILICON-NITRIDE FILMS TO OXYNITRIDES BY ARF EXCIMER-LASER IRRADIATION
Authors: SERRA J PARADA EG GONZALEZ P FERNANDEZ D CHIUSSI S POU J LEON B PEREZAMOR M
Citation: J. Serra et al., MODIFICATION OF SILICON-NITRIDE FILMS TO OXYNITRIDES BY ARF EXCIMER-LASER IRRADIATION, Surface & coatings technology, 80(1-2), 1996, pp. 211-215
PHOTOCHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS SILICON-CARBON THIN-FILMS BY USING A XE-2(ASTERISK) EXCIMER LAMP
Authors: REDONDAS X GONZALEZ P CHIUSSI S PARADA EG POU J LEON B PEREZAMOR M
Citation: X. Redondas et al., PHOTOCHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS SILICON-CARBON THIN-FILMS BY USING A XE-2(ASTERISK) EXCIMER LAMP, Applied surface science, 106, 1996, pp. 55-59
IMPROVEMENT OF SILICON PRIDE FILM PROPERTIES BY ULTRAVIOLET EXCIMER LAMP ANNEALING
Authors: PARADA EG GONZALEZ P SERRA J LEON B PEREZAMOR M FLICSTEIN J DEVINE RAB
Citation: Eg. Parada et al., IMPROVEMENT OF SILICON PRIDE FILM PROPERTIES BY ULTRAVIOLET EXCIMER LAMP ANNEALING, Applied surface science, 86(1-4), 1995, pp. 294-298
HYDROGEN INCORPORATION IN SILICON-OXIDE FILMS DEPOSITED BY ARF LASER-INDUCED CHEMICAL-VAPOR-DEPOSITION
Authors: PARADA EG GONZALEZ P SERRA J LEON B PEREZAMOR M DASILVA MF WOLTERS H SOARES JC
Citation: Eg. Parada et al., HYDROGEN INCORPORATION IN SILICON-OXIDE FILMS DEPOSITED BY ARF LASER-INDUCED CHEMICAL-VAPOR-DEPOSITION, Journal of non-crystalline solids, 187, 1995, pp. 75-80
Risultati: 1-8 |