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Results: 3
MODEL-BASED LITHOGRAPHIC TOOL CHOICES FOR A CONTINUOUS STATE-OF-THE-ART FACTORY
Authors: MALTABES JG PERKINSON TL LITT LC HERSHEY R MURPHY S
Citation: Jg. Maltabes et al., MODEL-BASED LITHOGRAPHIC TOOL CHOICES FOR A CONTINUOUS STATE-OF-THE-ART FACTORY, Microelectronic engineering, 42, 1998, pp. 97-101
SINGLE-WAFER CLUSTER TOOL PERFORMANCE - AN ANALYSIS OF THE EFFECTS OFREDUNDANT CHAMBERS AND REVISITATION SEQUENCES ON THROUGHPUT
Authors: PERKINSON TL GYURCSIK RS MCLARTY PK
Citation: Tl. Perkinson et al., SINGLE-WAFER CLUSTER TOOL PERFORMANCE - AN ANALYSIS OF THE EFFECTS OFREDUNDANT CHAMBERS AND REVISITATION SEQUENCES ON THROUGHPUT, IEEE transactions on semiconductor manufacturing, 9(3), 1996, pp. 384-400
SINGLE-WAFER CLUSTER TOOL PERFORMANCE - AN ANALYSIS OF THROUGHPUT
Authors: PERKINSON TL MCLARTY PK GYURCSIK RS CAVIN RK
Citation: Tl. Perkinson et al., SINGLE-WAFER CLUSTER TOOL PERFORMANCE - AN ANALYSIS OF THROUGHPUT, IEEE transactions on semiconductor manufacturing, 7(3), 1994, pp. 369-373
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