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Results: 1-10 |
Results: 10

Authors: PIETSCH GJ GIBALOV VI
Citation: Gj. Pietsch et Vi. Gibalov, DIELECTRIC BARRIER DISCHARGES AND OZONE SYNTHESIS, Pure and applied chemistry, 70(6), 1998, pp. 1169-1174

Authors: PIETSCH GJ
Citation: Gj. Pietsch, HYDROGEN ON SI - UBIQUITOUS SURFACE TERMINATION AFTER WET-CHEMICAL PROCESSING, Applied physics A: Materials science & processing, 60(4), 1995, pp. 347-363

Authors: PIETSCH GJ CHABAL YJ HIGASHI GS
Citation: Gj. Pietsch et al., THE ATOMIC-SCALE REMOVAL MECHANISM DURING CHEMOMECHANICAL POLISHING OF SI(100) AND SI(111), Surface science, 333, 1995, pp. 395-401

Authors: JANSCH HJ ARNOLDS H EBINGER HD POLENZ C POLIVKA C POLIVKA B PIETSCH GJ PREYSS W SAIER V VEITH R FICK D
Citation: Hj. Jansch et al., COVERAGE DEPENDENCE OF THE LOCAL-DENSITY OF STATES AT THE FERMI ENERGY - LI-ADSORBED ON RU(001), Physical review letters, 75(1), 1995, pp. 120-123

Authors: PIETSCH GJ CHABAL YJ HIGASHI GS
Citation: Gj. Pietsch et al., INFRARED-ABSORPTION SPECTROSCOPY OF SI(100) AND SI(111) SURFACES AFTER CHEMOMECHANICAL POLISHING, Journal of applied physics, 78(3), 1995, pp. 1650-1658

Authors: PIETSCH GJ KOHLER U HENZLER M
Citation: Gj. Pietsch et al., CHEMISTRY OF SILICON SURFACES AFTER WET CHEMICAL PREPARATION - A THERMODESORPTION SPECTROSCOPY STUDY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 78-87

Authors: PIETSCH GJ HIGASHI GS CHABAL YJ
Citation: Gj. Pietsch et al., CHEMOMECHANICAL POLISHING OF SILICON - SURFACE TERMINATION AND MECHANISM OF REMOVAL, Applied physics letters, 64(23), 1994, pp. 3115-3117

Authors: HEBARD AF EOM CB FLEMING RM CHABAL YJ MULLER AJ GLARUM SH PIETSCH GJ HADDON RC MUJSCE AM PACZKOWSKI MA KOCHANSKI GP
Citation: Af. Hebard et al., ENHANCED COHESION OF PHOTO-OXYGENATED FULLERENE FILMS - A NEW OPPORTUNITY FOR LITHOGRAPHY, Applied physics. A, Solids and surfaces, 57(3), 1993, pp. 299-303

Authors: PIETSCH GJ KOHLER U HENZLER M
Citation: Gj. Pietsch et al., ANISOTROPIC ETCHING VERSUS INTERACTION OF ATOMIC STEPS - SCANNING-TUNNELING-MICROSCOPY OBSERVATIONS ON HF NH4F-TREATED SI(111)/, Journal of applied physics, 73(10), 1993, pp. 4797-4807

Authors: JUSKO O KOHLER U PIETSCH GJ MULLER B HENZLER M
Citation: O. Jusko et al., TRENCH FORMATION IN SURFACTANT MEDIATED EPITAXIAL FILM GROWTH OF GE ON SI(100), Applied physics. A, Solids and surfaces, 54(3), 1992, pp. 265-269
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