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Results: 1-8 |
Results: 8

Authors: SUTCLIFFE R LEE WW GAYNOR JF LUTTMER JD MARTINI D KELBER J PLANO MA
Citation: R. Sutcliffe et al., CHARACTERIZATION AND ALUMINUM METALLIZATION OF A PARYLENE AF-4 SURFACE, Applied surface science, 126(1-2), 1998, pp. 43-56

Authors: PLANO MA
Citation: Ma. Plano, FASCINATING DIELECTRICS, Solid state technology, 38(12), 1995, pp. 16-16

Authors: HAN S WAGNER RS JOSEPH J PLANO MA MOYER MD
Citation: S. Han et al., CHEMICAL-VAPOR-DEPOSITED DIAMOND RADIATION DETECTORS FOR ULTRAHIGH RADIATION DOSE-RATE MEASUREMENTS - RESPONSE TO SUBNANOSECOND, 16-MEV ELECTRON PULSES, Review of scientific instruments, 66(12), 1995, pp. 5516-5521

Authors: AGER JW WALUKIEWICZ W MCCLUSKEY M PLANO MA LANDSTRASS MI
Citation: Jw. Ager et al., FANO INTERFERENCE OF THE RAMAN PHONON IN HEAVILY BORON-DOPED DIAMOND FILMS GROWN BY CHEMICAL-VAPOR-DEPOSITION, Applied physics letters, 66(5), 1995, pp. 616-618

Authors: FLEMISH JR SCHAUER SN WITTSTRUCK R LANDSTRASS MI PLANO MA
Citation: Jr. Flemish et al., GROWTH AND CHARACTERIZATION OF PHOSPHORUS-DOPED DIAMOND FILMS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 672-676

Authors: SCHAUER SN FLEMISH JR WITTSTRUCK R LANDSTRASS MI PLANO MA
Citation: Sn. Schauer et al., PHOSPHORUS INCORPORATION IN PLASMA-DEPOSITED DIAMOND FILMS, Applied physics letters, 64(9), 1994, pp. 1094-1096

Authors: PLANO MA ZHAO S GARDINIER CF LANDSTRASS MI KANIA DR KAGAN H GAN KK KASS R PAN LS HAN S SCHNETZER S STONE R
Citation: Ma. Plano et al., THICKNESS DEPENDENCE OF THE ELECTRICAL CHARACTERISTICS OF CHEMICAL-VAPOR-DEPOSITED DIAMOND FILMS, Applied physics letters, 64(2), 1994, pp. 193-195

Authors: PLANO MA LANDSTRASS MI PAN LS HAN S KANIA DR MCWILLIAMS S AGER JW
Citation: Ma. Plano et al., POLYCRYSTALLINE CVD DIAMOND FILMS WITH HIGH ELECTRICAL MOBILITY, Science, 260(5112), 1993, pp. 1310-1312
Risultati: 1-8 |