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Results: 2
SiO2 films deposited on silicon at low temperature by plasma-enhanced decomposition of hexamethyldisilazane: Defect characterization
Authors: Croci, S Pecheur, A Autran, JL Vedda, A Caccavale, F Martini, M Spinolo, G
Citation: S. Croci et al., SiO2 films deposited on silicon at low temperature by plasma-enhanced decomposition of hexamethyldisilazane: Defect characterization, J VAC SCI A, 19(5), 2001, pp. 2670-2675
Properties of SiO2 films deposited on silicon at low temperatures by plasma enhanced decomposition of hexamethyldisilazane
Authors: Pecheur, A Autran, JL Lazarri, JP Pinard, P
Citation: A. Pecheur et al., Properties of SiO2 films deposited on silicon at low temperatures by plasma enhanced decomposition of hexamethyldisilazane, J NON-CRYST, 245, 1999, pp. 20-26
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