Authors: Pendharkar, SV Resnick, DJ Laudon, MF Dauksher, WJ Mangat, PJS Seese, PA Cummings, KD

Citation: Sv. Pendharkar et al., Temperature gradients during absorber etching and their effect on x-ray mask patterning, J VAC SCI B, 16(6), 1998, pp. 3500-3503