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Evolution of the Er environment in a-Si : H under annealing: ion implantation versus co-deposition
Authors: Tessler, LR Piamonteze, C Alves, MCM Tolentino, H
Citation: Lr. Tessler et al., Evolution of the Er environment in a-Si : H under annealing: ion implantation versus co-deposition, J NON-CRYST, 266, 2000, pp. 598-602
Environment of Er in a-Si : H: Co-sputtering versus ion implantation
Authors: Piamonteze, C Tessler, LR Alves, MCM Tolentino, H
Citation: C. Piamonteze et al., Environment of Er in a-Si : H: Co-sputtering versus ion implantation, BRAZ J PHYS, 29(4), 1999, pp. 756-759
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