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Citation: Jc. Alonso et al., Fluorinated-chlorinated SiO2 films prepared at low temperature by remote plasma-enhanced chemical-vapor deposition using mixtures of SiF4 and SiCl4, J VAC SCI A, 19(2), 2001, pp. 507-514

Authors: Alonso, JC Pichardo, E Pankov, V Ortiz, A

Citation: Jc. Alonso et al., Effect of hydrogen dilution on the structure of SiOF films prepared by remote plasma enhanced chemical vapor deposition from SiF4-based plasmas, J VAC SCI A, 18(6), 2000, pp. 2827-2834