Authors: Perichon, S Lysenko, V Roussel, P Remaki, B Champagnon, B Barbier, D Pinard, P

Citation: S. Perichon et al., Technology and micro-Raman characterization of thick meso-porous silicon layers for thermal effect microsystems, SENS ACTU-A, 85(1-3), 2000, pp. 335-339

Authors: Malhaire, C Le Berre, M Febvre, D Barbier, D Pinard, P

Citation: C. Malhaire et al., Effect of clamping conditions and built-in stresses on the thermopneumaticdeflection of SiO2/Si membranes with various geometries, SENS ACTU-A, 74(1-3), 1999, pp. 174-177

Authors: Mouroux, A Epicier, T Zhang, SL Pinard, P

Citation: A. Mouroux et al., Microscopic evidence of C40 and C54 in (Ti,Ta)Si-2: Template mechanism, PHYS REV B, 60(12), 1999, pp. 9165-9168

Authors: Pecheur, A Autran, JL Lazarri, JP Pinard, P

Citation: A. Pecheur et al., Properties of SiO2 films deposited on silicon at low temperatures by plasma enhanced decomposition of hexamethyldisilazane, J NON-CRYST, 245, 1999, pp. 20-26