Authors: Sosnowski, M Albano, MA Babaram, V Gurudath, R Poate, JM Jacobson, D

Citation: M. Sosnowski et al., Ionization and mass spectrometry of decaborane for shallow implantation ofboron into silicon, J ELCHEM SO, 147(11), 2000, pp. 4329-4332

Authors: Bourdelle, KK Eaglesham, DJ Jacobson, DC Poate, JM

Citation: Kk. Bourdelle et al., The effect of as-implanted damage on the microstructure of threading dislocations in MeV implanted silicon, J APPL PHYS, 86(3), 1999, pp. 1221-1225