Citation: Z. Cui et P. Prewett, Comparative study of AZPF514 and UVIII chemically amplified resists for electron beam nanolithography, MICROEL ENG, 46(1-4), 1999, pp. 255-258
Authors:
Rosenbusch, A
Cui, Z
DiFabrizio, E
Gentili, M
Glezos, N
Meneghini, G
Nowotny, B
Patsis, G
Prewett, P
Raptis, I
Citation: A. Rosenbusch et al., Simulation of chemically amplified resist processes for 150 nm e-beam lithography, MICROEL ENG, 46(1-4), 1999, pp. 379-382