Authors:
Mikhaelashvili, V
Betzer, Y
Prudnikov, I
Orenstein, M
Ritter, D
Eisenstein, G
Citation: V. Mikhaelashvili et al., Electrical characteristics of metal-dielectric-metal and metal-dielectric-semiconductor structures based on electron beam evaporated Y2O3, Ta2O5 and Al2O3 thin film, J APPL PHYS, 84(12), 1998, pp. 6747-6752