Authors:
HERSHKOWITZ N
DING J
BREUN RA
CHEN RTS
MEYER J
QUICK AK
Citation: N. Hershkowitz et al., DOES HIGH-DENSITY LOW-PRESSURE ETCHING DEPEND ON THE TYPE OF PLASMA SOURCE, Physics of plasmas, 3(5), 1996, pp. 2197-2202
Citation: Ak. Quick et al., ETCH RATE AND PLASMA-DENSITY RADIAL UNIFORMITY MEASUREMENTS IN A CUSPED FIELD HELICON PLASMA ETCHER, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1041-1045