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CHEMICAL-VAPOR-DEPOSITION OF THIN COPPER-FILMS USING A NEW METALORGANIC PRECURSOR
Authors: GOSWAMI J RAGHUNATHAN L DEVI A SHIVASHANKAR SA CHANDRASEKARAN S
Citation: J. Goswami et al., CHEMICAL-VAPOR-DEPOSITION OF THIN COPPER-FILMS USING A NEW METALORGANIC PRECURSOR, Journal of materials science letters, 15(7), 1996, pp. 573-575
LOW-TEMPERATURE STRUCTURE OF 2 COPPER-BASED PRECURSORS FOR MOCVD - AQUABIS(TERT-BUTYL ACETOACETATO)COPPER(II) AND BIS(DIPIVALOYLMETHANIDO)COPPER(II)
Authors: PATNAIK S ROW TNG RAGHUNATHAN L DEVI A GOSWAMI J SHIVASHANKAR SA CHANDRASEKARAN S ROBINSON WT
Citation: S. Patnaik et al., LOW-TEMPERATURE STRUCTURE OF 2 COPPER-BASED PRECURSORS FOR MOCVD - AQUABIS(TERT-BUTYL ACETOACETATO)COPPER(II) AND BIS(DIPIVALOYLMETHANIDO)COPPER(II), Acta crystallographica. Section C, Crystal structure communications, 52, 1996, pp. 891-894
Risultati: 1-2 |