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Citation: R. Patzel et al., EXCIMER-LASER WITH HIGH-REPETITION-RATE FOR DUV LITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 165-167

Authors: ENDERT H PATZEL R REBHAN U POWELL M BASTING D

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Authors: ENDERT H PATZEL R POWELL M REBHAN U BASTING D

Citation: H. Endert et al., NEW KRF AND ARF EXCIMER-LASER FOR ADVANCED DUV LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 221-224

Authors: REBHAN U ENDERT H ZAAL G

Citation: U. Rebhan et al., MICROMANUFACTURING BENEFITS FROM EXCIMER-LASER DEVELOPMENT, Laser focus, 30(11), 1994, pp. 91

Authors: REBHAN U BASTING D

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