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Results:
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Results: 5
EXCIMER-LASER WITH HIGH-REPETITION-RATE FOR DUV LITHOGRAPHY
Authors:
PATZEL R BRAGIN I KLEINSCHMIDT J REBHAN U BASTING D
Citation:
R. Patzel et al., EXCIMER-LASER WITH HIGH-REPETITION-RATE FOR DUV LITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 165-167
NEW KRF AND ARF EXCIMER LASERS FOR ADVANCED DEEP-ULTRAVIOLET OPTICAL LITHOGRAPHY
Authors:
ENDERT H PATZEL R REBHAN U POWELL M BASTING D
Citation:
H. Endert et al., NEW KRF AND ARF EXCIMER LASERS FOR ADVANCED DEEP-ULTRAVIOLET OPTICAL LITHOGRAPHY, JPN J A P 1, 34(8A), 1995, pp. 4050-4054
NEW KRF AND ARF EXCIMER-LASER FOR ADVANCED DUV LITHOGRAPHY
Authors:
ENDERT H PATZEL R POWELL M REBHAN U BASTING D
Citation:
H. Endert et al., NEW KRF AND ARF EXCIMER-LASER FOR ADVANCED DUV LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 221-224
MICROMANUFACTURING BENEFITS FROM EXCIMER-LASER DEVELOPMENT
Authors:
REBHAN U ENDERT H ZAAL G
Citation:
U. Rebhan et al., MICROMANUFACTURING BENEFITS FROM EXCIMER-LASER DEVELOPMENT, Laser focus, 30(11), 1994, pp. 91
EXCIMER LASERS - CURRENT STATUS AND FUTURE-DEVELOPMENTS
Authors:
REBHAN U BASTING D
Citation:
U. Rebhan et D. Basting, EXCIMER LASERS - CURRENT STATUS AND FUTURE-DEVELOPMENTS, Berichte der Bunsengesellschaft fur Physikalische Chemie, 97(12), 1993, pp. 1509-1511
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