Authors: REHSE SJ GLUECK AD LEE SA GOULAKOV AB MENONI CS RALPH DC JOHNSON KS PRENTISS M

Citation: Sj. Rehse et al., NANOLITHOGRAPHY WITH METASTABLE NEON ATOMS - ENHANCED RATE OF CONTAMINATION RESIST FORMATION FOR NANOSTRUCTURE FABRICATION, Applied physics letters, 71(10), 1997, pp. 1427-1429