Authors: RHO SJ SHIM JY CHI EJ BAIK HK LEE SM

Citation: Sj. Rho et al., THE FIELD-EMISSION CHARACTERISTICS OF A-C-H THIN-FILMS PREPARED BY HELICAL RESONATOR PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, JPN J A P 2, 36(8A), 1997, pp. 1051-1054