Authors: RUOKAMO I KARKKAINEN T HUUSKO J RUOKANEN T BLOMBERG M TORVELA H LANTTO V

Citation: I. Ruokamo et al., H2S RESPONSE OF WO3 THIN-FILM SENSORS MANUFACTURED BY SILICON PROCESSING TECHNOLOGY, Sensors and actuators. B, Chemical, 19(1-3), 1994, pp. 486-488