Authors: Stoger, M Breymesser, A Schlosser, V Ramadori, M Plunger, V Peiro, D Voz, C Bertomeu, J Nelhiebel, M Schattschneider, P Andreu, J

Citation: M. Stoger et al., Investigation of defect formation and electronic transport in microcrystalline silicon deposited by hot-wire CVD, PHYSICA B, 274, 1999, pp. 540-543