Authors:
Stoger, M
Breymesser, A
Schlosser, V
Ramadori, M
Plunger, V
Peiro, D
Voz, C
Bertomeu, J
Nelhiebel, M
Schattschneider, P
Andreu, J
Citation: M. Stoger et al., Investigation of defect formation and electronic transport in microcrystalline silicon deposited by hot-wire CVD, PHYSICA B, 274, 1999, pp. 540-543