Authors:
Dauksher, WJ
Clemens, SB
Resnick, DJ
Smith, KH
Mangat, PJS
Rauf, S
Ventzek, PLG
Arunachalam, V
Ramamurthi, BN
Ashraf, H
Lea, L
Hall, S
Johnston, IR
Hopkins, J
Bhardwaj, JK
Citation: Wj. Dauksher et al., Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks, MICROEL ENG, 57-8, 2001, pp. 607-612
Citation: S. Rauf et Mj. Kushner, Controller design issues in the feedback control of radio frequency plasmaprocessing reactors, J VAC SCI A, 17(3), 1999, pp. 704-712
Citation: S. Rauf et Mj. Kushner, Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources, IEEE PLAS S, 27(5), 1999, pp. 1329-1338
Citation: S. Rauf et Mj. Kushner, Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation, J APPL PHYS, 85(7), 1999, pp. 3460-3469
Citation: S. Rauf et Mj. Kushner, Dynamics of a coplanar-electrode plasma display panel. II. Cell optimization, J APPL PHYS, 85(7), 1999, pp. 3470-3476