AAAAAA

   
Results: 1-12 |
Results: 12
Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks
Authors: Dauksher, WJ Clemens, SB Resnick, DJ Smith, KH Mangat, PJS Rauf, S Ventzek, PLG Arunachalam, V Ramamurthi, BN Ashraf, H Lea, L Hall, S Johnston, IR Hopkins, J Bhardwaj, JK
Citation: Wj. Dauksher et al., Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks, MICROEL ENG, 57-8, 2001, pp. 607-612
Integrated multi-scale model for ionized plasma physical vapor deposition
Authors: Arunachalam, V Rauf, S Coronell, DG Ventzek, PLG
Citation: V. Arunachalam et al., Integrated multi-scale model for ionized plasma physical vapor deposition, J APPL PHYS, 90(1), 2001, pp. 64-73
Ionized physical vapor deposition of Cu on 300 mm wafers: A modeling study
Authors: Rauf, S Ventzek, PLG Arunachalam, V
Citation: S. Rauf et al., Ionized physical vapor deposition of Cu on 300 mm wafers: A modeling study, J APPL PHYS, 89(5), 2001, pp. 2525-2534
Ionized physical vapor deposition of Cu using a mixture of rare gases
Authors: Rauf, S Ventzek, PLG
Citation: S. Rauf et Plg. Ventzek, Ionized physical vapor deposition of Cu using a mixture of rare gases, J APPL PHYS, 89(5), 2001, pp. 2535-2538
Plasma abatement of perfluorocompounds in inductively coupled plasma reactors
Authors: Xu, XD Rauf, S Kushner, MJ
Citation: Xd. Xu et al., Plasma abatement of perfluorocompounds in inductively coupled plasma reactors, J VAC SCI A, 18(1), 2000, pp. 213-231
Effect of bias voltage waveform on ion energy distribution
Authors: Rauf, S
Citation: S. Rauf, Effect of bias voltage waveform on ion energy distribution, J APPL PHYS, 87(11), 2000, pp. 7647-7651
Controller design issues in the feedback control of radio frequency plasmaprocessing reactors
Authors: Rauf, S Kushner, MJ
Citation: S. Rauf et Mj. Kushner, Controller design issues in the feedback control of radio frequency plasmaprocessing reactors, J VAC SCI A, 17(3), 1999, pp. 704-712
Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
Authors: Rauf, S Kushner, MJ
Citation: S. Rauf et Mj. Kushner, Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources, IEEE PLAS S, 27(5), 1999, pp. 1329-1338
Second triennial issue of images in plasma science
Authors: Kushner, MJ Rauf, S
Citation: Mj. Kushner et S. Rauf, Second triennial issue of images in plasma science, IEEE PLAS S, 27(1), 1999, pp. 4-5
Operation of a coplanar-electrode plasma display panel cell
Authors: Rauf, S Kushner, MJ
Citation: S. Rauf et Mj. Kushner, Operation of a coplanar-electrode plasma display panel cell, IEEE PLAS S, 27(1), 1999, pp. 10-11
Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation
Authors: Rauf, S Kushner, MJ
Citation: S. Rauf et Mj. Kushner, Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation, J APPL PHYS, 85(7), 1999, pp. 3460-3469
Dynamics of a coplanar-electrode plasma display panel. II. Cell optimization
Authors: Rauf, S Kushner, MJ
Citation: S. Rauf et Mj. Kushner, Dynamics of a coplanar-electrode plasma display panel. II. Cell optimization, J APPL PHYS, 85(7), 1999, pp. 3470-3476
Risultati: 1-12 |